IMEC-Clean is a wet cleaning method used to reduce the consumption of chemicals and DI water. The process first removes organic contaminants, creating a thin layer of chemical oxides that effectively remove particles. At the same time, a high concentration of ozone is injected into the DI water to form O3 water, which is then combined with other chemicals such as sulfuric acid to form a method of cleaning pollutants. This cleaning method can not only reduce the consumption of chemicals and DI water, but also avoid environmental pollution. In addition, according to relevant data, the IMEC cleaning method has good results in advanced CMOS manufacturing.

The IMEC clean process has important applications in the field of semiconductor manufacturing, especially in the manufacture of high-precision and high-reliability semiconductor devices such as integrated circuits, microprocessors, memory, etc. By using the IMEC clean process, manufacturing quality and reliability can be significantly improved, while also reducing manufacturing costs and manufacturing time.