Hualinkena (Jiangsu) Semiconductor Equipment Co., Ltd.

LAB SERVICE

Integrated Circuit
Discrete Device
Photoelectric Device
Sensor

Post-CMP Clean   Pre-oxidation Cleaning

Single Wafer Clean   Furnace Tube Cleaning

Spin Dryer   IMEC Clean

SiGe Etch   Si Etch

LAB INTRODUCTION

Hualinkena semiconductor wet process laboratory covers an area of 1000 square meters, including 800 square meters of 1000 grade clean room and 200 square meters of 100 grade clean room. Purchase laboratory platform necessary experiment and testing equipment and consumables, including KOH corrosion equipment, RCA cleaning equipment, organic cleaning equipment, oxidation cleaning equipment, metal corrosion equipment, implant surface treatment equipment, single cavity drying equipment, double cavity drying equipment, infrared welding equipment, scanning microscope, uniform instrument, super net workbench, electronic balance, etc. And equipped with the corresponding research and development of technical personnel, to build a pan-semiconductor wet process experiment platform.

LAB PROJECT

Thermal simulation simulation platform

Fluid dynamics of artifacts in wet chemical reaction and heat change by simulation software

Wet process verification

Pan-semiconductor wet process verification, including wet etching, acid-base corrosion, electrochemical plating, cleaning, etc.

Batch contract manufacturing

Provide wet process process OEM services