Email：xu@hlkncse.com
Tel：13358064333
Fluid Control Division​
Home >> Technical article >> Wet Bench Division >> Solutions to Wafer Oxidation and Acid Mist Leakage
Solutions to Wafer Oxidation and Acid Mist Leakage
With continuous breakthroughs in advanced processes and the large-scale rise of the third-generation semiconductor industry, high anti-oxidation performance, ultra-high cleanliness, strong corrosion resistance, and full-domain safety control have become rigid demands in wet processing for the general semiconductor industry. Long-standing production line problems such as wafer oxidation and deterioration, corrosive acid mist leakage, cross-contamination, high equipment operation and maintenance costs, and cumbersome operating procedures directly reduce yield and limit production capacity, which are core bottlenecks urgently to be solved in the upgrading of current wet processes.


To address these challenges, the Smart Clean Low-Oxygen Wet Process Workstation emerges as a professional wet processing equipment, which can efficiently solve key problems such as wafer oxidation and acid mist leakage from the source. This equipment is independently developed and manufactured by HualinKena (Jiangsu) Semiconductor Equipment Co., Ltd.

The core technologies of Hualing Kena’s equipment are: Precise Low-Oxygen Control + Class 100 Clean Protection + Full-Link Safety Interlock + AI Voice Contactless Control


1. Smart Clean Low-Oxygen Control: From “Ventilation” to “Oxygen Control” to Completely Solve Oxidation Pain Points

    • Top FFU supports switching between air/nitrogen modes; clean nitrogen is supplied in vertical laminar flow to quickly replace oxygen-containing air.

    • Built-in high-precision O₂ concentration detector monitors and stably maintains a low-oxygen environment in real time, with voice broadcast when standards are met.

    • Workpieces are transferred in a low-oxygen environment throughout acid (alkali) etching → rinsing, greatly shortening the oxidation window and eliminating oxidation scrappage.


2. Class 100 Clean Protection: Scientific Airflow, Zero Contamination Intrusion

    • Vertical laminar face velocity: 0.35–0.55 m/s, positive pressure air curtain isolates external contamination.

    • Airflow uniformity ≥90%, no turbulence or dead zones, harmful gas capture efficiency >99.999%.

    • Top-supply and bottom-exhaust counter airflow directly discharges acid mist and waste gas downward, achieving zero acid mist leakage.


3. Modular Integrated Design: 3-in-1 Structure for Smoother Processes

    • Integrated standardized clean air supply module + operation area + process tank/waste liquid storage area.

    • Workbench equipped with 3 standard stations: acid (alkali) tank (PVDF/PTFE + heating + temperature control), PP rinsing tank (spray/overflow/bubbling/fast discharge), and work surface.

    • Special loading and unloading areas on left and right sides of the equipment for continuous workpiece transfer in a low-oxygen environment.

    • Fully anti-corrosive waste liquid collection, anti-leakage tray, and secondary recovery system provide triple barriers to chemical diffusion.


4. Full Anti-Corrosion Hardware: Resistant to Strong Acids and Alkalis, Long-Term Stable and Reliable

    • Cabinet/workbench made of PP/SUS316L, corrosion resistance grade ≥10, resistant to highly corrosive media such as HF and HCl.

    • Acid (alkali) tank equipped with PTFE immersion heater for precise temperature control and suppression of acid mist volatilization.

    • Standard PP anti-corrosion water-gas gun supports nitrogen purging and DI water rinsing, with quick-connect and leak-free design.


5. Real-Time Leakage and Environmental Monitoring

    • Built-in waste liquid leakage sensor triggers triple alarms (audible-visual, three-color light, voice) immediately upon leakage.

    • High-frequency temperature and humidity sampling once per second, accuracy ±0.1℃/±1% RH, preventing condensation and water marks.

    • 24/7 online oxygen content monitoring with instant early warning and protection activation in case of abnormality.

6. Closed-Loop Safety Protection

    • Sliding door interlock: Equipment operates only when the door is closed to prevent oxygen backflow.

    • Emergency stop + power-off protection: One-key air shutoff and valve closing to avoid toxic gas cross-interference.


7. AI Voice Intelligent Control: Precise Operation Even with Gloves

    • Industrial-grade noise-reduction voice system, recognition rate ≥99.2% in ≤67dB environment, response time <0.5s.

    • Voice control for equipment start/stop, air volume adjustment, lighting, nitrogen filling, and exhaust switch, full contactless operation to reduce cross-contamination.

    • Abnormal voice broadcast for FFU failure, abnormal oxygen content, liquid leakage, over-temperature and over-humidity for real-time awareness.


8. Intelligent Operation and Maintenance: Hassle-Free, Energy-Saving, Traceable

    • Dual prediction model of FFU service life (pressure difference + time), 72-hour early warning for replacement.

    • Compatible with 485/Ethernet/MQTT protocols for centralized multi-machine control, remote diagnosis, and online upgrade.

    • Automatic storage of operation data, with historical curves, Excel export, and full alarm records to meet audit and traceability requirements.

    • Variable-frequency fan with adaptive speed regulation, saving ≥30% energy compared with traditional models, reducing long-term costs.

HualinKena Smart Clean Low-Oxygen Wet Process Workstation is more than a ventilation device—it is a low-oxygen anti-oxidation process station. It integrates oxygen control and anti-oxidation, Class 100 cleanliness, strong acid corrosion resistance, full-process safety, and contactless intelligent O&M, replacing traditional corrosion equipment. From semiconductors to optical glass, from R&D to mass production, it safeguards yield, safety, efficiency, and cost reduction for high-end wet processes throughout the entire process.